Large Magnetron PVD Sputtering SICN for all your projects!

Description

Large Magnetron PVD Sputtering SICN for all your projects!
Specifications  :
I. Vacuum Chamber
• stainless steel cube (800 X 800 X 820 mm)
• 2 unbalanced magnetrons (one fixed and the other movable)
• target size: 500 X 140 mm (11 mm thick)
II. Vacuum Chamber
• stainless steel cube (800 X 800 X 820 mm)
• 2 unbalanced magnetrons (one fixed and the other movable)
• target size: 500 X 140 mm (11 mm thick)
•  Rotative table
III. Pumping system (10-6 mbar)
• Mechanical pump: Alcatel Type 2063 (65 m3/h)
• Turbomolecular pump: Varian Model 969-9061 (1800 l/s)
• Liquid Nitrogen trap: SMC-TBT (15000 l/s for water)
IV. Pressure gauges
• 1 Pirani gauge (Balzers TPR 010)
• 1 cold cathode gauge (Balzers IKR 020) for high vacuum
• 2 Baratron absolute pressure gauges (MKS type 122A & 127A)
V. Power supplies
• magnetron sputtering: 20 kW, DC (SICN)
• plasma etching: 0 to -2500 V — 2 A, DC (SICN)
• bias voltage: 0 to -300 V — 2 A, DC (TCR 10, Electronics Measurements Inc.)
Shipping and handling not included.